Tool Qualification Policy
NCNC labmembers are responsible for developing and maintaining adequate skills to accomplish their research goals. Labmembers are expected to assist one another in learning to use the tools in the lab and cooperate with staff to ensure safe and effective operation.
Some tools require the approval of staff or a superuser before a member is considered to be qualified. These include:
- Alcatel DRIE
- JEOL848A SEM
- FEI NovaNanoSEM430 SEM
- Nanonex imprint lithography system
- Oxford Plasmalab ICP etcher
- FirstNano nanowire CVD reactor
- CHA electron beam evaporator
- CHA MPS4 sputtering system
- Karl-Suss contact Printer
- SVG-8000 photoresist track coater
- Dektak stylus profilometer
- Nanospec optical film thickness tool
- MRL furnaces
- Technics reactive ion etcher
- Technics plasma enhanced chemical vapor deposition tool
Members are cautioned that qualification merely implies that a labmember presents an acceptable level of risk to himself, the tool and others. Qualification is not a guarantee that a member can accomplish their own particular research goals.